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专利名称：Methods for improving positioning
performance of electron beam lithographyon magnetic wafers
发明人：Alexander Adrian Girling Driskill-Smith,Hieu
Lam,Kim Y. Lee
申请号：US10845956申请日：20040514
公开号：US20050252780A1公开日：20051117
专利附图：
摘要：The present invention discloses a method for the production of sub-micron
structures on magnetic materials using electron beam lithography. A subtractive processis disclosed wherein a portion of a magnetic material layer is removed from the substrateusing conventional lithography, and the remaining portion of the magnetic material layeris patterned by e-beam lithography. A additive process is also disclosed wherein a thinmagnetic seed layer is deposited on the substrate, a portion of which is removed byconventional lithography and replaced with a non-magnetic conducting layer. Theremaining portion of magnetic seed layer is patterned by e-beam lithography and thefinal magnetic structure produced by electroplating.
申请人：Alexander Adrian Girling Driskill-Smith,Hieu Lam,Kim Y. Lee
地址：Los Gatos CA US,Milpitas CA US,San Jose CA US
国籍：US,US,US
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