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专利名称：Repellency increasing structure and method
of producing the same, liquid ejection headand method of producing the same, andstain-resistant film
发明人：Kaneko, Yasuhisa,Takahashi, Shuji,Hotta,
Yoshinori,Fukunaga, Toshiaki
申请号：EP05026134.6申请日：20051130公开号：EP1666258B1公开日：20111005
摘要：The repellency increasing structure includes a substrate, if a surface of thesubstrate is flat, a flat surface of which shows lyophilic property with respect to a liquidhaving a surface tension lower than that of water and multiple recesses multiple and/orprojections that are formed in the surface of the substrate. Inner walls of the recessesand outer walls of the projections are substantially parallel to a thickness direction of thesubstrate. The structure further includes a repellent layer that covers the recesses andthe projections. In the liquid ejection head, a solution ejection surface around multiplethrough-holes of a ejection substrate corresponds to the surface of the substrate of therepellency increasing structure in which the recesses and/or the projections are formed.In the stain-resistant film, the substrate of the repellency increasing structure is asupport film.
申请人：FUJIFILM CORP
地址：JP
国籍：JP
代理机构：Klunker . Schmitt-Nilson . Hirsch
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