专利内容由知识产权出版社提供
专利名称：Porous materials
发明人：Ward G. Fillmore,Michael K.
Gallagher,Timothy G. Adams
申请号：US10974195申请日：20041027
公开号：US20050113472A1公开日：20050526
摘要：Methods of manufacturing a porous organic polysilica dielectric film areprovided, such method using a combination of UV and thermal energy. These methodsboth cure the organic polysilica dielectric material and remove the porogen.
申请人：Ward G. Fillmore,Michael K. Gallagher,Timothy G. Adams
地址：Hudson MA US,Hopkinton MA US,Sudbury MA US
国籍：US,US,US
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