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专利名称：Electrochemical etching cell
发明人：Hans Artmann,Wilhelm Frey,Franz Laermer申请号：US09937926申请日：20011226公开号：US06726815B1公开日：20040427
专利附图：
摘要：An electrochemical etching cell () is proposed for etching an etching body ()made at least superficially of an etching material. The etching cell () has at least onechamber filled with an electrolyte, and is provided with a first electrode (), which at leastsuperficially has a first electrode material, and with a second electrode () which at least
superficially has a second electrode material. Furthermore, the etching body () is incontact, at least region-wise, with the electrolyte. In this context, the first electrodematerial and the second electrode material are selected such that, after the etching, theetching body () is not contaminated and/or is not impaired in its properties by theelectrode materials. In particular, the electrode materials are the same materials as theetching material. Also proposed is a method for etching an etching body () using thisetching cell (), the first and/or the second electrode () being used as a sacrificial
electrode. The proposed etching cell is particularly suitable for etching silicon wafers in aCMOS-compatible production line.
申请人：ROBERT BOSCH GMBH
代理机构：Kenyon & Kenyon
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